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KMID : 0385520020150010087
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Analytical Science & Technology
2002 Volume.15 No. 1 p.87 ~ p.90
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Analysis of Trace Trichlorosilane in High Purity Silicon Tetrachloride by Near-IR Spectroscopy
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박찬조/Park CJ
이석근/Lee SG
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Abstract
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The content of SiHCl₃ as a trace impurity in SiCl₄ was analyzed by Near IR spectrophotometer with optical fiber. The strong absorption bands of 5345~5116㎝-¹ and 4848~4349㎝-¹ were used for analysis of SiHCl₃, and the detection limit of impurity SiHCl₃ was appeared to be 0.005% in the spectrum. The quantitative analysis by Near IR spectrophotometry showed the analytical possibility of trace impurity in SiCl₄ without sample pre-treatment not only in the laboratory but also in the field.
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